第9卷
/
1996 / 1
/
pp. 157 - 170
超高真空碲化鎘薄膜之製造
The Fabrication of CdTe Thin Film in Ultra High Vacuum
作者
貝瑞祥
(N/A)
彭文泰
(N/A)
貝瑞祥
N/A
彭文泰
N/A
中文摘要
本研究之目的在於利用熱蒸鍍技術在超高真空的環境下製造碲化鎘薄膜。康寧玻璃7059以及矽晶片被用來當作碲化鎘薄膜之基板。經由仔細的蒸鍍而獲得之薄膜樣品，我們使用X－射線繞射，歐傑電子能譜，以及X－射線光電子能譜分析之。
英文摘要
The CdTe thin films were fabricated by ultra high vacuum thermal evaporation technique. Two types of substrates, Corning 7059 glass and p-type Si(111), were used to deposit these films. After. Careful depositing these films, they were characterized by X-ray diffraction, Auger electron spectroscopy, and X-ray photoelectron spectroscopy.
中文關鍵字
薄膜;超高真空;表面分析
英文關鍵字
Thin film;Ultra high vacuum;Surface analysis